Contact Information:
TAZMO Inc.
42840 Christy St. Suite 103
Fremont, CA 94538
(510) 438-4890
eMail: Sales
eMail: Service
For our European partners, please visit www.teltec.com
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Resist Coater / Developer |
| CSX 1000 / 2000 Series | CSX 3000 Series | |
TAZMO develops and manufactures equipment for the LCD panels used in notebook PC's Televisions, Medical and other equipment.
Among our products, the spin coater in the color filter manufacturing process boasts the leading share of the world market.
We have overcome the problems associated with increased substrate size to achieve lower costs, space-saving capabilities, and highly accurate processing. |
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CSX 1000 & 2000 Series Spin Coater / Developer |
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CSX2000 series coater and developer has the flexibility and scalability to accommodate a wide range of needs including research and development as well as for mass production.
These High-quality process units are designed especially for thick-film process.
For equipment configuration, we adopted a cluster system allowing selection and configuration of individual processing units necessary for required depositing process, and prescribed process capacity. |
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Features |
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Platform |
- CSX2000 series is a process unit which can accommodate 150mm-200mm wafers from cassette to cassette, and enables automatic film formation and development. (Size and layout varies)
- Free layout design accommodates various processes and space requirement.
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Process unit |
Coater
- Configurable with various coaters; from a general coater which combines spin-coater and bake plate to a special coater which combines rotary cup unit and spinless coat unit. Configurable for several um to 100um film thickness formations.
Developer
- High speed developer unit is prepared for a development process. Process a long-time-development of thick film resist at high speed. (1/2-1/3 compared to former unit).
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Operability |
- GUI screen realizes a superior operability. Easily edit complicated recipe. System configuration, which considers from research and development to mass production line, improves functionality.
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Specifications |
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Applied Work |
150mm to 200mm wafer |
Control system |
Full control via desktop PC system |
Power source |
3φ, AC200V, 50/60Hz |
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CSX 3000 Series Spin Coater / Developer |
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CSX3000 series are designed to meet 3D IC backend process applications including Cu pillar, Solder bump, and RDL.
In order to achieve the intricate formation, a wide range of films need to be coated and developed with high uniformity at minimal cost.
CSX3000 series is expanding the install base in major production line and satisfying customer demands with lower CoO performance. |
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Features |
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Platform |
- CSX3000 series is a process unit which can accommodate 200mm-300mm wafers from cassette to cassette, and enables automatic film formation and development. (Size and layout varies)
- Free layout design accommodates various processes and space requirement.
|
Process unit |
Coater
- Configurable with various coaters; from a general coater which combines spin-coater and bake plate to a special coater which combines rotary cup unit and spinless coat unit. Configurable for several um to 100um film thickness formations.
Developer
- High speed developer unit is prepared for a development process. Process a long-time-development of thick film resist at high speed. (1/2-1/3 compared to former unit).
|
Operability |
- GUI screen realizes a superior operability. Easily edit complicated recipe. System configuration, which considers from research and development to mass production line, improves functionality.
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Specifications |
|
Applied Work |
200mm-300mm wafer, square substrate |
Control system |
Full control via desktop PC system |
Power source |
3φ, AC200V, 50/60Hz |
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